Facilities

UM offers state-of-the-art facilities for computation, fabrication, and characterization via the Advanced Research Computing Technical Services, the Lurie Nanofabrication Laboratory, the Michigan Center for Materials Characterization, and the Michigan Ion Beam Laboratory. A new shared facility for high throughput materials discovery is being developed and made available to academic and industrial users via the Materials Research Facilities Network. The Combinatorial Materials Additive Manufacturing Laboratory houses two high-end additive manufacturing machines that are be outfitted with specialized capabilities needed for IRG2 and IRG3. In addition, the Shared Facilities include the High Throughput Wafer-Scale Layer Characterizer, consisting of a high-resolution x-ray photoelectron spectroscopy system interconnected with atomic-layer deposition and chalcogenide molecular-beam epitaxy systems of key importance for IRG1. The XPS system also serves the entire MRSEC and facilitates future seed projects in the direction of autonomous laboratories and learned thin film deposition technologies.